Calibre Design Solutions delivers the most accurate, most trusted, and best-performing IC sign-off verification and DFM optimization in the EDA industry. We partner with TSMC to ensure mutual customers have the tools and technologies they need for success.
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Calibre Manufacturing at SPIE Advanced Litho 2022

Join us at the SPIE Advanced Litho Conference 2022 at the San Jose Convention Center.

Exhibition Dates/Times

  • April 26: 10am – 5pm
  • April 27: 10am – 4pm

Visit us at Booth #208

If you need assistance outside of booth hours, email us with questions

Attend sessions

Calibre IC Manufacturing papers at SPIE 2022

Join Calibre IC Manufacturing at SPIE Advanced Lithography 2022, April 24-28, 2022 at the San Jose Convention Center. Siemens will be presenting 12 papers. (all presentations listed in Pacific Time)

25 April 2022

25 April 2022 • 2:10 PM - 2:30 PM
EUV based multi-patterning schemes for advanced DRAM nodes
Paper 12055-10

26 April 2022

26 April 2022 • 9:40 AM - 10:00 AM
Simultaneous source-mask-laser spectrum optimization
Paper 12052-4

26 April 2022 • 10:10 AM - 10:30 AM
Calibration of Gaussian Random Field stochastic EUV models
Paper 12051-14

26 April 2022 • 1:30 PM - 1:50 PM
Machine learning based error classification for curvilinear designs

27 April 2022

27 April 2022 • 1:30 PM - 1:50 PM
Advances in OPC etch modeling
Paper 12056-10

27 April 2022 • 1:50 PM - 2:10 PM
Robust qualification flows for DRC decks using high coverage synthetic layout generation
Paper 12052-30

27 April 2022 • 2:30 PM - 2:50 PM
Smart down-sampling using SONR
Paper 12052-32

27 April 2022 • 4:00 PM - 4:20 PM
Pareto front optimization for enhanced model prediction accuracy
Paper 12052-36

27 April 2022 • 5:30 PM - 7:30 PM (Presentation Time TBD)
Virtual cross metrology: leveraging process sequence for improved process characterization
Paper 12053-68

28 April 2022

28 April 2022 • 10:20 AM - 10:40 AM
Fast full-chip curvilinear ILT mask generation with machine learning technology
Paper 12052-23

28 April 2022 • 10:40 AM - 11:00 AM
A machine learning approach to inverse lithography
Paper 12052-24

On Demand Session

Learn from our experts

Read from our prior SPIE publications from the 2021 conference, as well as learn the new innovations in Calibre IC Manufacturing solutions.

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