Calibre Manufacturing at SPIE Advanced Litho 2022

25 April 2022 • 2:10 PM - 2:30 PM
EUV based multi-patterning schemes for advanced DRAM nodes
Paper 12055-10

26 April 2022 • 9:40 AM - 10:00 AM
Simultaneous source-mask-laser spectrum optimization
Paper 12052-4

26 April 2022 • 10:10 AM - 10:30 AM
Calibration of Gaussian Random Field stochastic EUV models
Paper 12051-14

26 April 2022 • 1:30 PM - 1:50 PM
Machine learning based error classification for curvilinear designs

27 April 2022 • 1:30 PM - 1:50 PM
Advances in OPC etch modeling
Paper 12056-10

27 April 2022 • 1:50 PM - 2:10 PM
Robust qualification flows for DRC decks using high coverage synthetic layout generation
Paper 12052-30

27 April 2022 • 2:30 PM - 2:50 PM
Smart down-sampling using SONR
Paper 12052-32

27 April 2022 • 4:00 PM - 4:20 PM
Pareto front optimization for enhanced model prediction accuracy
Paper 12052-36

27 April 2022 • 5:30 PM - 7:30 PM (Presentation Time TBD)
Virtual cross metrology: leveraging process sequence for improved process characterization
Paper 12053-68

28 April 2022 • 10:20 AM - 10:40 AM
Fast full-chip curvilinear ILT mask generation with machine learning technology
Paper 12052-23

28 April 2022 • 10:40 AM - 11:00 AM
A machine learning approach to inverse lithography
Paper 12052-24