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Calibre Manufacturing at SPIE Advanced Lithography 2026
Join us at the SPIE Advanced Lithography conference 2026 at the San Jose Convention Center.
Conference Feb 22 - 26 | Exhibition Feb 24 - 25
Visit us at Booth #707
If you need assistance outside of booth hours, email us with questions.
Customer Reception + Networking
Join us for an informal customer reception and networking evening.
Date & Time: Wednesday, February 25 | 5:00–7:00 PM
Location: Coastal Manor (Bar & Restaurant), Marriott Hotel
Light refreshments and beverages will be served. We look forward to connecting and continuing the conversation in a relaxed setting.
👉 Request an invitation to attend (by invitation only)
“We are pleased to once again collaborate with SPIE to award the eighth annual Nick Cobb Memorial Scholarship to Shilong Zhang who is pursuing a PhD in Electrical Engineering at Korea Advanced Institute of Science and Technology (KAIST) in Daejeon, South Korea. His doctoral research focuses on advancing next‑generation mask technology for semiconductor lithography. Under the guidance of faculty in design and manufacturing, Zhang’s work centers on developing machine‑learning (ML)–driven approaches to make curvilinear optical proximity correction (OPC) faster, more accurate, and practical for real manufacturing use — making ML-guided curvilinear OPC a deployable, industry‑ready technology. . The scholarship honors Nick's pioneering work in the field of lithography and his significant contributions as the chief architect of the Siemens EDA Calibre OPC solutions. ..."
YuYang Sun, Vice President of Product Management for Siemens EDA's Calibre Semiconductor Manufacturing Solutions.
Calibre IC Manufacturing papers at SPIE 2026
Join Calibre IC Manufacturing at SPIE Advanced Lithography 2026, Feb. 22 - 26, at the San Jose Convention Center. Siemens will be presenting 16 papers including 13 oral papers and 3 posters. (All presentations are listed in Pacific Time.)